cmpAPC Modules

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cmpAPC

Logo cmp apc
Screenshot cmp Analysis View with Diagram Panel
Screenshot cmp Analysis View with Diagram Panel

Features

cmpAPC combines a modern interface with a clear, workflow-oriented user experience. Engineers can move through complex CMP APC workflows quickly because the architecture is structured, modular, and consistent.

  • General

cmpAPC offers APC functionality for engineers and production teams in the CMP area of semiconductor production.

The calculation of the polishing times is fully automated. The engineer can control and check every detail of the prediction. Extensive analysis possibilities give the user an overview of the process.

R2R solution for CMP

Calculate startup values for CMP tools to optimize the process. The extension is a 1-channel optimizer for the removal rate. Pad and head ages are available for monitoring and  advanced control models.

Intuitive user interface

cmpAPC is available as a dedicated plug-in for the BlueLine UI framework and provides extensive tools for analyzing and configuring CMP processes.

cmpAPC offers APC functionality for engineers and production teams in the CMP area of semiconductor production.

The calculation of the polishing times is fully automated. The engineer can control and check every detail of the prediction. Extensive analysis possibilities give the user an overview of the process.

Master data and parameterization

APC behavior is fully configurable through master data. Master data can define actions or control information such as wafer layouts, target sets, and parameter models.
Each master data item can be parameterized. Parameters can be defined in lookup tables or retrieved from external data sources, giving engineers flexible control over process configuration with minimal effort.

cmpAPC offers APC functionality for engineers and production teams in the CMP area of semiconductor production.

The calculation of the polishing times is fully automated. The engineer can control and check every detail of the prediction. Extensive analysis possibilities give the user an overview of the process.

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  • Standard

Full inline integration

cmpAPC is fully integrated into the production line. On request from MES or automation, the module provides the optimized polish time for the next carrier. The system stores input data, measurement results, and tool counters as the basis for future predictions.

Detailed CMP controller setup

The CMP R2R controller can be configured in detail, including optimizer weighting, filter settings, constraints, and aging effects.

R2R levels allow fine-grained configuration for startup-value calculations.

Full data management included

All failure values are stored in the database and are accessible for the user. The user can access the used and failure value. Master data are used to setup the process. The flexible parameterization approach allows to define a global setup for the whole FAB and device or tool specific parameterization. Even, the usage of external data sources for parameterization is supported.

Statistics

cmpAPC includes a powerful statistics engine for visualizing process data across multiple chart types.

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