News
2024 Review
In 2024, our primary focus was customer delivery while we continued to advance lithoAPC. To achieve even more precise results, we integrated R as an additional solver into our system. This allows us to leverage the extensive mathematical capabilities of R, including LP and NLP systems. The integration was completed without compromising stability or security for our customers. Over the past 12 months, the system has run continuously without interruption and with consistently responsive behavior. With this foundation in place, we are now set to tackle complex NLP challenges in the coming months.
Another key milestone was the modularization of our Wafer Layout Views. While these have always been separate modules, they are now evolving into a standalone product. This enables other users to effortlessly visualize wafer layouts and associated data. Additionally, export functionality for PNG, SVG, and PDF formats is already in place, making data sharing and analysis even more efficient.
Stay tuned for further updates as we continue to push boundaries in process optimization and visualization!
2023 Review
2023 was a productive year. We added several new capabilities and migrated the project to a modern build system and platform. Key improvements include:
– We extended the plug-in portfolio with a new CVD module. The APC platform now covers
- Litho
- cd,
- overlay,
- cmp and
- plasma
- etch,
- cvd.
This includes complete analysis and R2R functionality for each module.
– We also introduced new statistical views for faster feedback on measurement data
– The offline overlay analysis now supports the latest IVS data-file format and can fully replace the IVS viewer.
– The APC system can now connect to an R server as a computational backend. This opens the door for a new level of data analysis and prediction quality.
– the build system is migrated from intellij based files to maven.
– We migrated the platform from Java 8 to Java 17, enabling modern JDK features and JVM-based libraries.
Over the following weeks, we focused on testing and final refinements. Some of the used models will benefit from the new R-server integration.
August 2021
The next APC module is in the final stage of development, and system testing with real production data is about to begin. Once again, the BlueLine APC platform demonstrates that new process areas can be integrated efficiently and with strong results. Of course, we had to connect to all sensors (measurement tools) and to the process tool itself.
As usual, the data flow was one of the most important steps. This includes data input, data output, and the correct merge of multiple data streams. The merge step often contains process-specific logic that requires a precise implementation. A common example is the send-a-head (pilot) handling in the litho department and the rework flow.
With the new APC module, BlueLine now supports the major semiconductor processes.
February 06, 2021
This week, we successfully connected several kindergartens via VPN. This enables the kindergarten operator to access the central data repository from every location. The objective was to balance cost, system stability, and transmission speed. For this purpose, we developed our own BlueLine VPN Box based on open-source software. It establishes a secured connection designed to withstand external attacks.
This network provides the foundation for more than 200 network devices, telephone systems, and more than 100 users. Maintenance is performed almost entirely through remote administration.
January 25, 2021
BlueLine AG has started development of the next major APC module. With the platform concept proven, the next process area will be implemented on the same architecture. The plan is to start system testing in the middle of 2021 and to start production in the early fall.
At the same time, the existing modules for overlay, critical dimension (lithoApc) and polish (cmpApc) will be expanded with new functions. The platform architecture and extensibility of the APC solution create strong synergies that directly benefit users.
December 2020
Two new modules are ready and are now undergoing intensive system testing. The IA (Internal Automation) module supports the delayed processing of incoming messages. This makes it possible to fully trace processing retrospectively. This feature is very useful for testing, support and synchronization of APC databases.
The DR (Data Removal) module deletes all data that leaves a predefined time range. This helps to keep the data volume and response time of the APC solution constant. The deletion is performed with minimal load on the database and without affecting the behavior of the APC solution.
cmpApc is released
A few weeks ago, cmpAPC was activated for production.
After 10 months of focused work, we are proud to see that this APC module meets the requirements of a logic fab operating in a high-mix, low-volume environment.
During the last months we have already seen the promising forecasts during the tests – but there is a difference if you only look at the numbers or if you observe the influence on the production. Now this question is answered – the support of the CMP process with all facets of the process is shown.
cmpAPC is now a full-fledged part of the BlueLine APC product family.